Tantalum [Ta] Sputter Target used for Magnetron Sputtering Physical Vapour Deposition.
Various diameters, thicknesses and purities available to suit all major sputter source manufacturers.
All our materials are tested using ICP-OES chemical analysis and manufactured under ISO9001:2008 certification.
Materials are vacuum packed under cleanroom conditions to ensure zero contamination.
If your size, quantity or purity is not available please contact us for a personalised quotation.