Tantalum Sputtering Target [Ta]

USD$687.00 - USD$2,647.00
(No reviews yet) Write a Review
0.10 KGS
Calculated at Checkout

Tantalum [Ta] Sputter Target used for Magnetron Sputtering Physical Vapour Deposition.

Various diameters, thicknesses and purities available to suit all major sputter source manufacturers.

All our materials are tested using ICP-OES chemical analysis and manufactured under ISO9001:2008 certification.

Materials are vacuum packed under cleanroom conditions to ensure zero contamination.

If your size, quantity or purity is not available please contact us for a personalised quotation.