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Tantalum Sputter Target [Ta]

$687.00
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Weight:
0.10 Ounces
Tantalum Sputter Target

Tantalum [Ta] Sputter Target used for Magnetron Sputtering Physical Vapour Deposition.

Various diameters, thicknesses and purities available to suit all major sputter source manufacturers.

All our materials are tested using ICP-OES chemical analysis and manufactured under ISO9001:2008 certification.

Materials are vacuum packed under cleanroom conditions to ensure zero contamination.

If your size, quantity or purity is not available please contact us for a personalised quotation.