Indium Tin Oxide Sputtering Target [ITO] (In2O3/SnO2 90/10 WT%)

USD$263.00 - USD$783.00
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0.10 KGS
Calculated at Checkout

Indium Tin Oxide [ITO] Sputter Target used for Magnetron Sputtering Physical Vapour Deposition. Composition is (In2O3/SnO2 90/10 WT%). Custom compositions on request.

Various diameters, thicknesses and purities available to suit all major sputter source manufacturers.

Available in pre-bonded assemblies with OFHC Cu backing plate and indium bonding included. Please note that the Cu backing plate will add another 1/8" (3mm) to the target thickness.

If you require a custom geometry, purity or design then please do not hesitate to contact us for a quotation.

All our materials are tested using ICP-OES chemical analysis and manufactured under ISO9001:2008 certification.

Materials are vacuum packed under cleanroom conditions to ensure zero contamination.

If your size, quantity or purity is not available please contact us for a personalised quotation.