The cookie settings on this website are set to 'allow all cookies' to give you the very best experience. Please click Accept Cookies to continue to use the site.

Hafnium Oxide Sputtering Target [HfO2]

$700.00 $630.00
(You save $70.00)
(No reviews yet) Write a Review
Weight:
0.10 Ounces
Hafnium Oxide Sputtering Target [HfO2]

Hafnium Oxide [HfO2] Sputter Target used for Magnetron Sputtering Physical Vapour Deposition.

Various diameters, thicknesses and purities available to suit all major sputter source manufacturers.

Available in pre-bonded assemblies with OFHC Cu backing plate and indium bonding. Please note that the Cu backing plate will add another 1/8" (3mm) to the target thickness.

If you require a custom geometry, purity or design then please do not hesitate to contact us for a quotation.

All our materials are tested using ICP-OES chemical analysis and manufactured under ISO9001:2008 certification.

Materials are vacuum packed under cleanroom conditions to ensure zero contamination.

If your size, quantity or purity is not available please contact us for a personalised quotation.