Standard Oxide Sputtering Targets Now Available From NanoVac

Standard Oxide Sputtering Targets Now Available From NanoVac

Posted by NanoVac on Jun 22nd 2017

NanoVac is pleased to announce our standard range of oxide magnetron sputtering targets pre-bonded to copper backing plates.

Copper backing plates are essential in providing fragile oxide sputtering targets with mechanical strength and heat dissipation, preventing target cracking and breakages.

Our new standard range of oxide magnetron sputtering targets include:

Aluminium Oxide [Al2O3]

Hafnium Oxide [HfO2]

Indium Gallium Tin Oxide [InGaZnO4]

Indium Tin Oxide [ITO]

Silicon Dioxide [SiO2]

Titanium Dioxide [TiO2]

Zinc Oxide [ZnO]

As well as offering standard sizes and materials we can manufacture any custom sputter target material and dimensions to suit your magnetron sputtering source.